| 摘要 |
The present invention relates to an impedance matching device and a substrate processing apparatus, and more specifically, to an impedance matching device for performing impedance matching in a plasma substrate processing apparatus, and a substrate processing apparatus using the same. According to an embodiment of the present invention, the impedance matching device comprises: a variable capacitor; a motor for varying the position of the variable capacitor to have a capacitance for removing the reflection loss of input power; a matching detector for detecting whether impedance is matched; a motor driving unit for rotating the motor to control the capacitance of the variable capacitor according to a signal which is detected by the matching detector; and a lifetime prediction unit for receiving the accumulated number of rotations of the motor from the motor driving unit, and determining, based on the number, whether to replace the variable capacitor or the motor. |
