| 摘要 |
<p>The present invention relates to an apparatus for processing a substrate, and more specifically, to an apparatus for processing a substrate, which prevents pollutants from sticking to the substrate. The apparatus comprises: a heat treatment chamber having a heat treatment space to the substrate; a substrate support supporting the substrate in the heat treatment space; a heating block in which a heating lamp is installed on each lamp installation groove formed in a lamp installation surface facing the substrate; and an individual light transmission plate transmitting light emitted from the heating lamp and arranged on each lamp installation groove.</p> |
