发明名称 VAPOR DEPOSITION MASK, VAPOR DEPOSITION MASK WITH FRAME, AND PRODUCTION METHOD OF ORGANIC SEMICONDUCTOR ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a vapor deposition mask and a vapor deposition mask with a frame, which satisfies high definition with light weight, having strength of an opening, and which prevents shadow generation, even when the mask is made large.SOLUTION: Metal masks 10 in which a slit 15 is provided on one face of a resin mask 20 with an opening 25 corresponding to a deposited pattern are stacked, in a deposition mask 100. In an inner wall face composing the opening 25 has at least one inflection point in a cross section of a thickness direction. A first intersection Q1 is an intersection of the inner wall face with a first face which is a face not contacting the metal mask 10 of the resin mask 20. A second intersection Q2 is an intersection of the inner wall with a second face which is a face contacting the metal mask 10 of the resin mask 20. In inflection points, S1 is a first inflection point from the first intersection Q1 to the second intersection Q2. An angle of a straight line connecting the first intersection Q1 and the first inflection point S1, to the first face, is made larger than an angle of a straight line connecting the first inflection point S1 and the second inflection point Q2, to the second face, in the deposition mask 100.
申请公布号 JP2015117432(A) 申请公布日期 2015.06.25
申请号 JP20140207030 申请日期 2014.10.08
申请人 DAINIPPON PRINTING CO LTD 发明人 TAKEDA TOSHIHIKO;OBATA KATSUYA;KAWASAKI HIROSHI
分类号 C23C14/24;H01L51/50;H05B33/10 主分类号 C23C14/24
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