发明名称 |
SATURABLE ABSORBING ELEMENT, SATURABLE ABSORBING ELEMENT PRODUCING METHOD, AND LASER APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a saturable absorbing element having a wide absorption band, a high light absorbance, and a high modulation depth. ! SOLUTION: A saturable absorbing element producing method includes: a step of forming carbon nanowalls 12 on a substrate 10; a step of embedding the substrate 10 on which the carbon nanowalls 12 are formed with resin 14; a step of releasing the substrate 10 from the resin 14 with which the substrate 10 is embedded after embedding the carbon nanowalls 12 on the substrate 10; and a step of removing graphite 11 on bottoms of the carbon nanowalls 12 formed at a time of forming the carbon nanowalls 12 on the substrate 10. ! COPYRIGHT: (C)2015,JPO&INPIT |
申请公布号 |
JP2015118348(A) |
申请公布日期 |
2015.06.25 |
申请号 |
JP20130263302 |
申请日期 |
2013.12.20 |
申请人 |
IHI CORP |
发明人 |
OMI SOICHIRO ; KAWAGUCHI NORIHITO ; KONDO MISAO ; HARASAKI OSAMU |
分类号 |
G02F1/361;B82Y20/00;B82Y40/00;C01B31/02;H01S3/098 |
主分类号 |
G02F1/361 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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