发明名称 SATURABLE ABSORBING ELEMENT, SATURABLE ABSORBING ELEMENT PRODUCING METHOD, AND LASER APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a saturable absorbing element having a wide absorption band, a high light absorbance, and a high modulation depth. ! SOLUTION: A saturable absorbing element producing method includes: a step of forming carbon nanowalls 12 on a substrate 10; a step of embedding the substrate 10 on which the carbon nanowalls 12 are formed with resin 14; a step of releasing the substrate 10 from the resin 14 with which the substrate 10 is embedded after embedding the carbon nanowalls 12 on the substrate 10; and a step of removing graphite 11 on bottoms of the carbon nanowalls 12 formed at a time of forming the carbon nanowalls 12 on the substrate 10. ! COPYRIGHT: (C)2015,JPO&INPIT
申请公布号 JP2015118348(A) 申请公布日期 2015.06.25
申请号 JP20130263302 申请日期 2013.12.20
申请人 IHI CORP 发明人 OMI SOICHIRO ; KAWAGUCHI NORIHITO ; KONDO MISAO ; HARASAKI OSAMU
分类号 G02F1/361;B82Y20/00;B82Y40/00;C01B31/02;H01S3/098 主分类号 G02F1/361
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