发明名称 |
SEMICONDUCTOR ELEMENT, SEMICONDUCTOR DEVICE INCLUDING THE SAME, AND METHOD FOR MANUFACTURING SEMICONDUCTOR ELEMENT |
摘要 |
To provide a semiconductor element that can have the high adhesion between a substrate made of an oxide or the like and a metal film, a semiconductor element includes a substrate made of an oxide, a semiconductor element structure provided on an upper surface of the substrate, and a metal film provided on a lower surface of the substrate, in which the metal film contains nanoparticles made of an oxide. |
申请公布号 |
US2015179537(A1) |
申请公布日期 |
2015.06.25 |
申请号 |
US201414581826 |
申请日期 |
2014.12.23 |
申请人 |
Nichia Corporation |
发明人 |
SHIOJI Shuji;KURAMOTO Masafumi |
分类号 |
H01L23/15;H01L29/41 |
主分类号 |
H01L23/15 |
代理机构 |
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代理人 |
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主权项 |
1. A semiconductor element comprising:
a substrate made of an oxide; a semiconductor element structure provided on an upper surface of the substrate; and a metal film provided on a lower surface of the substrate, wherein the metal film contains nanoparticles made of an oxide. |
地址 |
Anan-shi JP |