发明名称 Semiconductor Device and Method of Forming Fine Pitch RDL Over Semiconductor Die in Fan-Out Package
摘要 A semiconductor device has a first conductive layer including a plurality of conductive traces. The first conductive layer is formed over a substrate. The conductive traces are formed with a narrow pitch. A first semiconductor die and second semiconductor die are disposed over the first conductive layer. A first encapsulant is deposited over the first and second semiconductor die. The substrate is removed. A second encapsulant is deposited over the first encapsulant. A build-up interconnect structure is formed over the first conductive layer and second encapsulant. The build-up interconnect structure includes a second conductive layer. A first passive device is disposed in the first encapsulant. A second passive device is disposed in the second encapsulant. A vertical interconnect unit is disposed in the second encapsulant. A third conductive layer is formed over second encapsulant and electrically connected to the build-up interconnect structure via the vertical interconnect unit.
申请公布号 US2015179570(A1) 申请公布日期 2015.06.25
申请号 US201314139614 申请日期 2013.12.23
申请人 STATS ChipPAC, Ltd. 发明人 Marimuthu Pandi C.;Lin Yaojian;Choi Won Kyoung;Shim Il Kwon
分类号 H01L23/522;H01L25/065;H01L21/56 主分类号 H01L23/522
代理机构 代理人
主权项 1. A method of making a semiconductor device, comprising: providing a substrate; forming a first conductive layer over the substrate; disposing a semiconductor die over the first conductive layer; disposing a first encapsulant over the semiconductor die; removing the substrate; disposing a second encapsulant over the first encapsulant; and forming an interconnect structure over the first conductive layer and second encapsulant.
地址 Singapore SG