发明名称 |
Semiconductor Device and Method of Forming Fine Pitch RDL Over Semiconductor Die in Fan-Out Package |
摘要 |
A semiconductor device has a first conductive layer including a plurality of conductive traces. The first conductive layer is formed over a substrate. The conductive traces are formed with a narrow pitch. A first semiconductor die and second semiconductor die are disposed over the first conductive layer. A first encapsulant is deposited over the first and second semiconductor die. The substrate is removed. A second encapsulant is deposited over the first encapsulant. A build-up interconnect structure is formed over the first conductive layer and second encapsulant. The build-up interconnect structure includes a second conductive layer. A first passive device is disposed in the first encapsulant. A second passive device is disposed in the second encapsulant. A vertical interconnect unit is disposed in the second encapsulant. A third conductive layer is formed over second encapsulant and electrically connected to the build-up interconnect structure via the vertical interconnect unit. |
申请公布号 |
US2015179570(A1) |
申请公布日期 |
2015.06.25 |
申请号 |
US201314139614 |
申请日期 |
2013.12.23 |
申请人 |
STATS ChipPAC, Ltd. |
发明人 |
Marimuthu Pandi C.;Lin Yaojian;Choi Won Kyoung;Shim Il Kwon |
分类号 |
H01L23/522;H01L25/065;H01L21/56 |
主分类号 |
H01L23/522 |
代理机构 |
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代理人 |
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主权项 |
1. A method of making a semiconductor device, comprising:
providing a substrate; forming a first conductive layer over the substrate; disposing a semiconductor die over the first conductive layer; disposing a first encapsulant over the semiconductor die; removing the substrate; disposing a second encapsulant over the first encapsulant; and forming an interconnect structure over the first conductive layer and second encapsulant. |
地址 |
Singapore SG |