| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a gas barrier film excellent in a gas barrier property such as the oxygen and the water vapor, and to provide a method for manufacturing the same. <P>SOLUTION: The gas barrier film is composed by carrying out laminated integration of a vapor deposition film 20, alkoxysilane (A) that has radical polymerization radical, alkoxysilane (B) that does not have the radical polymerization radical, and a gas barrier resin layer 30 constituted by curing the composition including water, on a synthetic resin film 10. The gas barrier resin layer 30 has a fine network structure formed by alkoxysilane's (B) crosslinking between radical polymerization bodies of alkoxysilane (A) and can highly prevent gas penetration such as the oxygen and the water vapor, and have an excellent strength. <P>COPYRIGHT: (C)2012,JPO&INPIT</p> |
