| 摘要 |
<p>An apparatus for treating substrates comprises: a substrate support unit supporting a substrate; and a liquid medicine supply unit supplying an organic solvent, a rinse liquid, and chemicals on the substrate supported on the substrate support unit. The liquid medicine supply unit comprises: an organic solvent supply member supplying the organic solvent; a rinse liquid supply member having a first nozzle which supplies the rinse liquid; a chemical supply member having a second nozzle which supplies the chemicals; and a controller controlling the organic solvent supply member, the rinse liquid supply member, and the chemical supply member so that the organic solvent, the rinse liquid, and the chemicals are sequentially supplied.</p> |
