发明名称 ポリウレタン発泡体及び研磨パッド
摘要 The present invention provides a polyurethane foam, which, despite having a low specific gravity, has a hardness and an elasticity favorable for a polishing pad, and a polishing pad made using the polyurethane foam. The polyurethane foam is obtained by reacting a blend composition containing (A) a polyisocyanate, (B) a polyol, (C) a chain extender with a molecular weight of equal to or smaller than 400, and (D) water, and in the blend composition, MDI is blended as a main component of the component (A) and a blending amount of the MDI is 45 to 70 parts by weight when a total weight of the respective components (A), (B), and (C) is taken as 100 parts by weight.
申请公布号 JP5736231(B2) 申请公布日期 2015.06.17
申请号 JP20110099934 申请日期 2011.04.27
申请人 トーヨーポリマー株式会社;ニッタ・ハース株式会社 发明人 後藤 充朗;竹本 和生;大嶋 伸之;羽場 真一;吉田 光一;河合 孝夫
分类号 C08G18/40;B24B37/24;C08G101/00;H01L21/304 主分类号 C08G18/40
代理机构 代理人
主权项
地址