发明名称 SYSTEM AND METHOD FOR GENERATING PULSE WITH LINEAR SLOPE
摘要 The present invention relates to an apparatus and a method for generating pulses for plasma applied to a semiconductor or a display process and, more specifically, to a system and a method for generating pulse power having a linear slope to supply even energy to ions in a plasma state.
申请公布号 KR20150066126(A) 申请公布日期 2015.06.16
申请号 KR20130151276 申请日期 2013.12.06
申请人 EN TECHNOLOGIES INC. 发明人 LEE, TAY SEEK;SONG, JHONG HWAN
分类号 H03K3/53 主分类号 H03K3/53
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