发明名称 |
SYSTEM AND METHOD FOR GENERATING PULSE WITH LINEAR SLOPE |
摘要 |
The present invention relates to an apparatus and a method for generating pulses for plasma applied to a semiconductor or a display process and, more specifically, to a system and a method for generating pulse power having a linear slope to supply even energy to ions in a plasma state. |
申请公布号 |
KR20150066126(A) |
申请公布日期 |
2015.06.16 |
申请号 |
KR20130151276 |
申请日期 |
2013.12.06 |
申请人 |
EN TECHNOLOGIES INC. |
发明人 |
LEE, TAY SEEK;SONG, JHONG HWAN |
分类号 |
H03K3/53 |
主分类号 |
H03K3/53 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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