| 摘要 |
<p>Provided is a noble method for generating a pattern including a pattern of a cell including an auxiliary pattern arranged therein. Provided is a generation method for generating the pattern of cell used when a pattern of a mask is generated by arranging a selected cell of a plurality of cells. The generation method includes: obtaining data of cell including a rectangular pattern element, generating an auxiliary pattern supporting resolution of the rectangular pattern element based on the data, and generating the pattern including the isolated rectangular pattern element and the auxiliary pattern as the pattern of cell.</p> |
