发明名称 |
METHOD FOR GROWING COMPOUND SEMICONDUCTOR |
摘要 |
PROBLEM TO BE SOLVED: To provide a compound semiconductor layer subjected to lattice matching at a high throughput while checking the lattice matching during the growth of a compound semiconductor.SOLUTION: When a ternary or quaternary compound semiconductor (mixed crystal semiconductor) grows on a semiconductor substrate or pseudo substrate, an amount of warpage of a substrate warped per unit time is estimated by grasping a lattice constant, a thermal expansion coefficient and a growth rate and a curvature of the substrate during the growth is measured in situ on the other hand. By determining whether or not these two amounts of the warpage match with each other, a material composition of a growth layer is decided to grow a semiconductor that is lattice matched. |
申请公布号 |
JP2015109389(A) |
申请公布日期 |
2015.06.11 |
申请号 |
JP20130252410 |
申请日期 |
2013.12.05 |
申请人 |
NIPPON TELEGR & TELEPH CORP <NTT> |
发明人 |
NAKAO AKIRA;ARAI MASAKAZU;IGA RYUZO;KAMITOKU MASAKI |
分类号 |
H01L21/205;C23C16/30;C23C16/52;C30B25/16;H01L21/66;H01L33/00 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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