发明名称 METHOD FOR GROWING COMPOUND SEMICONDUCTOR
摘要 PROBLEM TO BE SOLVED: To provide a compound semiconductor layer subjected to lattice matching at a high throughput while checking the lattice matching during the growth of a compound semiconductor.SOLUTION: When a ternary or quaternary compound semiconductor (mixed crystal semiconductor) grows on a semiconductor substrate or pseudo substrate, an amount of warpage of a substrate warped per unit time is estimated by grasping a lattice constant, a thermal expansion coefficient and a growth rate and a curvature of the substrate during the growth is measured in situ on the other hand. By determining whether or not these two amounts of the warpage match with each other, a material composition of a growth layer is decided to grow a semiconductor that is lattice matched.
申请公布号 JP2015109389(A) 申请公布日期 2015.06.11
申请号 JP20130252410 申请日期 2013.12.05
申请人 NIPPON TELEGR & TELEPH CORP <NTT> 发明人 NAKAO AKIRA;ARAI MASAKAZU;IGA RYUZO;KAMITOKU MASAKI
分类号 H01L21/205;C23C16/30;C23C16/52;C30B25/16;H01L21/66;H01L33/00 主分类号 H01L21/205
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