METHOD AND APPARATUS FOR MEASURING THICKNESS OF SAMPLE ATTACHED ON SUBSTERATE

摘要

The present invention relates to a method and an apparatus for measuring a thickness of a sample attached on a substrate. The method for measuring a thickness of a sample attached on a substrate according to an embodiment of the present invention comprises: a step of detecting an intensity of an initial X-ray propagating through an empty area; a step of detecting an intensity of a first transmission X-ray transmitting through a first transmission body comprised of a substrate only and an intensity of a first scattered X-ray scattered from the first transmission body; a step of detecting an intensity of a second transmission X-ray transmitting through a second transmission body comprised of the substrate and a sample attached on the substrate and an intensity of a second scattered X-ray scattered from the sample; and a step of calculating the thickness of the sample from the initial X-ray intensity, the first and second transmission X-ray intensities, and the first and second scattered X-ray intensities. Additionally, the apparatus for measuring a thickness of a sample attached on a substrate is disclosed.