发明名称 |
COMPONENT FOR PLASMA PROCESSING APPARATUS AND METHOD FOR MANUFACTURING COMPONENT FOR PLASMA PROCESSING APPARATUS |
摘要 |
The present invention provides a component for a plasma processing apparatus, the component comprising: a base material; an underlayer covering a surface of the base material; and an yttrium oxide film covering a surface of the underlayer, wherein the underlayer comprises a metal oxide film having a thermal conductivity of 35 W/m·K or less, the yttrium oxide film contains at least either particulate portions made of yttrium oxide or non-particulate portions made of yttrium oxide, the particulate portions being portions where a grain boundary demarcating an outer portion of the grain boundary is observed under a microscope, and the non-particulate portions being portions where the grain boundary is not observed under a microscope, the yttrium oxide film has a film thickness of 10 μm or more and a film density of 96% or more, and when a surface of the yttrium oxide film is observed under a microscope, an area coverage ratio of the particulate portions is 0 to 20% in an observation range of 20 μm×20 μm and an area coverage ratio of the non-particulate portions is 80 to 100% in the observation range. |
申请公布号 |
US2015152540(A1) |
申请公布日期 |
2015.06.04 |
申请号 |
US201314402523 |
申请日期 |
2013.05.22 |
申请人 |
KABUSHIKI KAISHA TOSHIBA ;TOSHIBA MATERIALS CO., LTD. |
发明人 |
Sato Michio;Hino Takashi;Nakatani Masashi |
分类号 |
C23C4/12;C23C4/10 |
主分类号 |
C23C4/12 |
代理机构 |
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代理人 |
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主权项 |
1. A component for a plasma processing apparatus, the component comprising:
a base material; an underlayer covering a surface of the base material; and an yttrium oxide film covering a surface of the underlayer, wherein the underlayer comprises a metal oxide film having a thermal conductivity of 35 W/m·K or less, the yttrium oxide film contains at least either particulate portions made of yttrium oxide or non-particulate portions made of yttrium oxide, the particulate portions being portions where a grain boundary demarcating an outer portion of the grain boundary is observed under a microscope, and the non-particulate portions being portions where the grain boundary is not observed under a microscope, the yttrium oxide film has a film thickness of 10 μm or more and a film density of 96% or more, and when a surface of the yttrium oxide film is observed under a microscope, an area coverage ratio of the particulate portions is 0 to 20% in an observation range of 20 μm×20 μm and an area coverage ratio of the non-particulate portions is 80 to 100% in the observation range. |
地址 |
Tokyo JP |