| 发明名称 |
METHOD FOR MEASURING INCLINATION OF BEAM, DRAWING METHOD, DRAWING APPARATUS, AND METHOD OF MANUFACTURING OBJECT |
| 摘要 |
The present invention relates to a method for measuring inclination of a beam emitted to a substrate with respect to an optical-axis direction of an optical system for forming the beam. The method includes moving the substrate to a first height and a second height and turning the substrate about a rotational axis in the optical-axis direction. The method further includes acquiring a beam position with respect to the substrate situated at each of the first height and the second height both before and after the turning and determining the inclination of the beam based on the first height, the second height, and the beam positions. |
| 申请公布号 |
US2015155137(A1) |
申请公布日期 |
2015.06.04 |
| 申请号 |
US201414553555 |
申请日期 |
2014.11.25 |
| 申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
Sentoku Koichi;Oishi Satoru;Ina Hideki |
| 分类号 |
H01J37/304;G01C9/06;G03F7/20;G01B21/22 |
主分类号 |
H01J37/304 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method for measuring inclination of a beam emitted to a substrate with respect to an optical-axis direction of an optical system for forming the beam, the method comprising:
moving the substrate to a first height and a second height; turning the substrate about a rotational axis in the optical-axis direction; acquiring a beam position with respect to the substrate situated at each of the first height and the second height both before and after the turning; and determining the inclination of the beam based on the first height, the second height, and the beam positions. |
| 地址 |
Tokyo JP |
