发明名称 Nonvolatile memory devices and methods forming the same
摘要 Provided are nonvolatile memory devices and methods of forming the same. The nonvolatile memory device includes a plurality of word lines, a ground select line, string select line, and a dummy word line. Each of distances between the dummy word line and the ground select line and between the dummy word line and the word line is greater than a distance between a pair of the word lines adjacent to each other.
申请公布号 US9047952(B2) 申请公布日期 2015.06.02
申请号 US201314135049 申请日期 2013.12.19
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 Lee Changhyun;Son Byoungkeun
分类号 H01L27/088;G11C16/04;H01L21/28;H01L27/115 主分类号 H01L27/088
代理机构 Muir Patent Consulting, PLLC 代理人 Muir Patent Consulting, PLLC
主权项 1. A nonvolatile memory device comprising: a substrate; a group of first word lines on the substrate; a ground select line on the substrate; and a first dummy word line on the substrate, the first dummy word line being interposed between the group of first word lines and the ground select line, wherein a first distance between the ground select line and the first dummy word line is greater than a second distance between the first dummy word line and a nearest one of the group of first word lines to the first dummy word line, wherein the second distance is greater than a third distance between adjacent first word lines.
地址 Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do KR