发明名称 |
Nonvolatile memory devices and methods forming the same |
摘要 |
Provided are nonvolatile memory devices and methods of forming the same. The nonvolatile memory device includes a plurality of word lines, a ground select line, string select line, and a dummy word line. Each of distances between the dummy word line and the ground select line and between the dummy word line and the word line is greater than a distance between a pair of the word lines adjacent to each other. |
申请公布号 |
US9047952(B2) |
申请公布日期 |
2015.06.02 |
申请号 |
US201314135049 |
申请日期 |
2013.12.19 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
Lee Changhyun;Son Byoungkeun |
分类号 |
H01L27/088;G11C16/04;H01L21/28;H01L27/115 |
主分类号 |
H01L27/088 |
代理机构 |
Muir Patent Consulting, PLLC |
代理人 |
Muir Patent Consulting, PLLC |
主权项 |
1. A nonvolatile memory device comprising:
a substrate; a group of first word lines on the substrate; a ground select line on the substrate; and a first dummy word line on the substrate, the first dummy word line being interposed between the group of first word lines and the ground select line, wherein a first distance between the ground select line and the first dummy word line is greater than a second distance between the first dummy word line and a nearest one of the group of first word lines to the first dummy word line, wherein the second distance is greater than a third distance between adjacent first word lines. |
地址 |
Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do KR |