发明名称 SILICON CARBIDE INGOT AND PRODUCTION METHOD OF SILICON CARBIDE SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a silicon carbide ingot capable of suppressing warpage of a substrate when being cut by using a wire saw by a fixed abrasive-grain system, and to provide a production method of a silicon carbide substrate executed by using the silicon carbide ingot.SOLUTION: A silicon carbide ingot 1 has an end face 1a and an end face 1b which is an end face on the opposite side to the end face 1a. In the silicon carbide ingot 1, the gradient of a nitrogen concentration in a growth direction which is a facing direction of the end face 1a and the end face 1b is 1×10cmor more and 1×10cmor less.
申请公布号 JP2015098420(A) 申请公布日期 2015.05.28
申请号 JP20130239995 申请日期 2013.11.20
申请人 SUMITOMO ELECTRIC IND LTD 发明人 HORI TSUTOMU;SASAKI MAKOTO;HONKE TSUBASA;KAWASE TOMOHIRO
分类号 C30B29/36;B24B27/06;B28D5/04;C30B33/00;H01L21/304 主分类号 C30B29/36
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