OVERLAY MEASURING METHOD AND OVERLAY MEASURING APPARATUS

摘要

PROBLEM TO BE SOLVED: To enable simple and robust overlay measurement in a region where an actual device circuit pattern is formed in the manufacturing of a semiconductor device.SOLUTION: A method of measuring an overlay among a plurality of exposure processes for a semiconductor device in which a circuit pattern is formed by the plurality of exposure processes, includes: picking up a measurement image at a designated measurement coordinate position of the semiconductor device; reading an image library in which a plurality of template images corresponding to the circuit pattern formed at the designated measurement coordinate position of the semiconductor device and an overlay linked to each of the plurality of template images are stored in advance; calculating a similarity between each of the plurality of template images included in the read image library and the measurement image; and measuring an overlay in the measurement image on the basis of the calculated similarity between each of the plurality of template images and the measurement image.