High heat load optics with a liquid metal interface for use in an extreme ultraviolet lithography system

摘要

Methods and apparatus for cooling mirrors in an extreme ultraviolet (EUV) lithography system using a liquid metal interface are described. According to one aspect of the present invention, an apparatus which may be used in an EUV lithography system includes a heat exchanger, a mirror assembly, and a first liquid metal interface. The heat exchanger including at least a first surface. The mirror assembly includes a first mirror block having a first mirrored surface, as well as at least a first well. Finally, the first liquid metal interface includes liquid metal which is contained in the first well. The first surface is in contact with the liquid metal such that heat may be transferred from the first mirror block to the heat exchanger.

主权项

1. An apparatus comprising:
a heat exchanger, the heat exchanger including at least a first surface; a mirror assembly, the mirror assembly including a first mirror block having a first mirrored surface, the mirror assembly having at least a first well defined therein, wherein the heat exchanger is separated from the mirror assembly; and a first liquid metal interface, the first liquid metal interface including liquid metal, the liquid metal being contained in the at least first well, wherein the first surface is in contact with the liquid metal to transfer heat from the first mirror block to the heat exchanger and wherein the first surface of the heat exchanger is immersed in the liquid metal within the first well.