发明名称 |
PATTERN FORMING METHOD, AND, ELECTRONIC DEVICE PRODUCING METHOD AND ELECTRONIC DEVICE, EACH USING THE SAME |
摘要 |
A pattern forming method includes: (a) forming a first film on a substrate using an actinic ray-sensitive or radiation-sensitive resin composition (I) containing a resin of which solubility in a developer containing an organic solvent decreases due to polarity increased by an action of an acid; (b) exposing the first film; (c) developing the exposed first film using a developer containing an organic solvent to form a first negative pattern; (e) forming a second film on the substrate using an actinic ray-sensitive or radiation-sensitive resin composition (II) containing a resin of which solubility in a developer containing an organic solvent decreases due to polarity increased by an action of an acid; (f) exposing the second film; and (g) developing the exposed second film using a developer containing an organic solvent to form a second negative pattern in this order. |
申请公布号 |
US2015140482(A1) |
申请公布日期 |
2015.05.21 |
申请号 |
US201514606161 |
申请日期 |
2015.01.27 |
申请人 |
FUJIFILM Corporation |
发明人 |
YAMANAKA Tsukasa;IGUCHI Naoya;UEBA Ryosuke;YAMAMOTO Kei |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
1. A pattern forming method comprising:
(a) forming a first film on a substrate using an actinic ray-sensitive or radiation-sensitive resin composition (I) which contains a resin of which solubility in a developer containing an organic solvent decreases due to polarity increased by an action of an acid; (b) exposing the first film; (c) developing the exposed first film using a developer containing an organic solvent to form a first negative pattern; (e) forming a second film on the substrate on which the first negative pattern is formed using an actinic ray-sensitive or radiation-sensitive resin composition (II) which contains a resin of which solubility in a developer containing an organic solvent decreases due to polarity increased by an action of an acid; (f) exposing the second film; and (g) developing the exposed second film using a developer containing an organic solvent to form a second negative pattern, in this order. |
地址 |
Tokyo JP |