MANUFACTURING METHOD OF SUBSTRATE WITH COATING FILM, SUBSTRATE WITH COATING FILM OBTAINED BY THE MANUFACTURING METHOD, AND SEMICONDUCTOR MANUFACTURING APPARATUS MEMBER WITH COATING FILM

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing method of a substrate with coating film in which the substrate has thermal spray coating film having high plasma resistance on a surface, a substrate with coating film obtained by the manufacturing method, and a semiconductor manufacturing apparatus member with coating film.SOLUTION: A manufacturing method of a substrate with coating film comprises: a slurry adjustment step of dispersing raw material power with ceramic particles, in which abundance ratio (volume-based) of particles having an average particle diameter at 1 to 8 μm and a particle diameter within a range from 0.5 to 10 μm is 85% or more, as a main component in organic solvent to obtain slurry; and a coating film forming process of feeding the slurry to a thermal spray jet flow ejected from a thermal spray gun and thermally spraying the slurry to form coating film on a surface of the substrate.