SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

摘要

PROBLEM TO BE SOLVED: To effectively prevent pattern collapse at a time of substrate drying by securely replacing a cleaning solvent on a substrate surface with a volatile solvent and to improve productivity of such a substrate.SOLUTION: A substrate processing apparatus 10 includes a solvent supply unit 58 having, as accessories, magnetic field formation means. Magnetic field formation means 100 applies a magnetic field to a surface of a substrate W where a cleaning liquid and a volatile solvent coexist, stirs and mixes the cleaning liquid and the volatile solvent on the surface of the substrate W, and promotes replacement of the cleaning liquid with the volatile solvent.