Method of fabricating microlens, and depth sensor including microlens

摘要

A method of fabricating a microlens includes forming layer of photoresist on a substrate, patterning the layer of photoresist, and then reflowing the photoresist pattern. The layer of photoresist is formed by coating the substrate with liquid photoresist whose viscosity is 150 to 250 cp. A depth sensor includes a substrate and photoelectric conversion elements at an upper portion of the substrate, a metal wiring section disposed on the substrate, an array of the microlenses for focusing incident light as beams onto the photoelectric conversion elements and which beams avoid the wirings of the metal wiring section. The depths sensor also includes a layer presenting a flat upper surface on which the microlenses are formed. The layer may be a dedicated planarization layer or an IR filter, interposed between the microlenses and the metal wiring section.

主权项

1. A depth pixel comprising:
a convex microlens consisting of photoresist that focuses rays of light incident thereon, wherein the height of the microlens is in a range of 0.1 μm±0.01 μm to 9.9 μm±0.01 μm; and a photoelectric element that converts light received thereby to electric charges, the photoelectric element being positioned relative to the microlens so as to receive rays of light incident on and focused by the microlens.