VAPOR DEPOSITION MATERIAL AND METHOD OF PRODUCING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a vapor deposition material that improves an evaporation rate and prevents the occurrence of splash.SOLUTION: A vapor deposition material comprises metallic silicon, silicon monoxide and silicon dioxide. An atom ratio (O/Si ratio) of metallic silicon and oxygen is 0.95 or more and 1.05 or less, a central particle size of metallic silicon is 5μm or more and 10μm or less, and a central particle size of silicon monoxide is 20μm or more and 200μm or less.