| 发明名称 |
ISOLATOR FOR A SUBSTRATE PROCESSING CHAMBER |
| 摘要 |
A processing kit for a plasma processing chamber. The processing kit includes a plurality of ceramic arc-shaped pieces. Each arc-shaped piece has a concave first end and a convex second end and the first end of each arc-shaped piece is configured to mate with an adjacent end of a neighboring arc-shaped piece to form a ring shaped inner isolator. |
| 申请公布号 |
US2015122775(A1) |
申请公布日期 |
2015.05.07 |
| 申请号 |
US201414522196 |
申请日期 |
2014.10.23 |
| 申请人 |
Applied Materials, Inc. |
发明人 |
SANKARAKRISHNAN Ramprakash |
| 分类号 |
H01J37/32;C23C16/513;C23F4/00 |
主分类号 |
H01J37/32 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A processing kit for a plasma processing chamber, comprising:
a plurality of ceramic arc-shaped pieces, each arc-shaped piece having a concave first end and a convex second end, the first end of each arc-shaped piece configured to mate with an adjacent end of a neighboring arc-shaped piece to form a ring shaped inner isolator. |
| 地址 |
Santa Clara CA US |
