| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a technique advantageous for superposition inspection of an imprint device. <P>SOLUTION: An inspection method of an imprint device which performs imprint processing for molding an imprint material on a substrate to form a pattern on the substrate comprises: a fist step of supplying a first imprint material to the substrate; a second step of forming a first mark by molding the first imprint material supplied by the first step; a third step of supplying a second imprint material to the substrate; a fourth step of forming a second mark by molding the second imprint material supplied by the third step; and a fifth step of measuring a relative position between the first mark formed by the second step and the second mark formed by the fourth step. The third step supplies the second imprint material so that the second imprint material does not come into contact with the first mark formed by the second step. <P>COPYRIGHT: (C)2012,JPO&INPIT</p> |
