| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method for manufacturing a mask blank, capable of forming a thin film having less foreign matter defects and excellent quality.SOLUTION: The method for manufacturing a mask blank for transfer has a characteristic in the step of forming a thin film by reactive sputtering and includes the step of flying sputtering particles toward the surface to be deposited of a substrate from a target provided in a vacuum chamber to form the thin film. In the step of forming the thin film, the sputtering target consists of a sintered body including metal silicide, and a rare gas component included in sputtering gas is neon, helium or a mixed gas of neon and helium.</p> |
