发明名称 |
METHODS TO INTRODUCE SUB-MICROMETER, SYMMETRY-BREAKING SURFACE CORRUGATION TO SILICON SUBSTRATES TO INCREASE LIGHT TRAPPING |
摘要 |
Provided is a method for fabricating a nanopatterned surface. The method includes forming a mask on a substrate, patterning the substrate to include a plurality of symmetry- breaking surface corrugations, and removing the mask. The mask includes a pattern defined by mask material portions that cover first surface portions of the substrate and a plurality of mask space portions that expose second surface portions of the substrate, wherein the plurality of mask space portions are arranged in a lattice arrangement having a row and column, and the row is not oriented parallel to a [110] direction of the substrate. The patterning the substrate includes anisotropically removing portions of the substrate exposed by the plurality of spaces. |
申请公布号 |
WO2015058105(A1) |
申请公布日期 |
2015.04.23 |
申请号 |
WO2014US61178 |
申请日期 |
2014.10.17 |
申请人 |
STC.UNM |
发明人 |
HAN, SANG, EON;HOARD, BRITTANY, R.;HAN, SANG, M.;GHOSH, SWAPNADIP |
分类号 |
H01L31/0236;H01L31/18 |
主分类号 |
H01L31/0236 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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