| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure device having a lighting/unlighting control system of a mercury lamp which allows for unlighting of the mercury lamp even during exposure processing, while taking account of a JOB currently under exposure processing, the processing time of a JOB in reservation and the stable state arrival time when lighting the mercury lamp.SOLUTION: In a lighting control method of an exposure device having a plurality of lamps as a light source for performing exposure processing of a substrate, a lighting/unlighting schedule of the lamp is created so as not to affect the exposure processing time, while taking account of the number of lamps used in a JOB currently under exposure processing and a JOB in reservation and the estimated processing time, and the stable state arrival time when lighting the lamps used, and then lighting/unlighting control is performed based on the schedule. |
