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发明名称
NEGATIVE-WORKING THICK FILM PHOTORESIST
摘要
<p>Disclosed are compositions for negative-working thick film photophotoresists based on acrylic co-polymers. Also included are methods of using the compositions.</p>
申请公布号
EP2861638(A1)
申请公布日期
2015.04.22
申请号
EP20130723081
申请日期
2013.05.13
申请人
AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.À.R.L.
发明人
CHEN, CHUNWEI;LU, PINGHUNG;LIU, WEIHONG;TOUKHY, MEDHAT A.;KIM, SANGCHUL;LAI, SOOKMEE
分类号
C08F220/18;G03F7/027;G03F7/033;G03F7/038
主分类号
C08F220/18
代理机构
代理人
主权项
地址
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