Processo e dispositivo de tratamento de superfície de pelo menos uma peça por meio de fontes elementares de plasma por ressonância ciclotrônica eletrônica

摘要

A method of treating a surface of at least one part by individual sources of an electron cyclotron resonance plasma is characterized by subjecting the part(s) to at least one movement of revolution with regard to at least one fixed linear row of elementary sources. The linear row or rows of elementary sources are disposed parallel to the axis or axes of revolution of the part or parts.