| 摘要 |
<p>Provided is a Fe-Al alloy sputtering target having an Al content of 1 to 23 at%, an oxygen content of 100 wt ppm or less, and the balance being Fe and inevitable impurities. Also, provided is a method of producing a Fe-Al alloy sputtering target having an Al content of 1 to 23 at%, an oxygen content of 100 wt ppm or less, and the balance being Fe and inevitable impurities, the method in which: a Fe raw material and an Al raw material, i.e., 1 to 23 at% of Al and the balance being Fe and inevitable impurities, are melted at a melting temperature of 1200 to 1600°C and an average rate of raising temperature of 300°C/hr or more (wherein, when the Al content is 15 to 23 at%, the melting is performed at a melting temperature in the range of 1400 to 1600°C and an average rate of raising temperature of 320°C/hr or more or at a melting temperature from 1200°C to less than 1400°C; and when the Al content is 1 to 15%, the melting is performed in an Ar atmosphere at a melting temperature in the range of 1200 to 1600°C and an average rate of raising temperature of 300°C/hr or more or is performed in the air at a melting temperature in the range of 1200 to 1600°C and an average rate of raising temperature of 320°C/hr or more); and the melted materials are cast, followed by rolling and machining. The present invention aims at providing a Fe-Al-based sputtering target having a reduced oxygen content, and providing a high-density sputtering target that can reduce occurrence of the phenomenon of abnormal discharge (micro arcing) and occurrence of particles during sputtering.</p> |
