| 发明名称 | Method and apparatus for treatment of self-assemblable polymer layers for use in lithography | ||
| 摘要 | Treatment of a layer comprising self-assemblable polymer at a surface of a substrate is disclosed. In an embodiment, the treatment includes arranging a zone of temperature change to sweep across the layer, wherein a temperature of the layer within the zone differs from an initial temperature of the layer prior to passage of the zone. | ||
| 申请公布号 | US9011978(B2) | 申请公布日期 | 2015.04.21 |
| 申请号 | US201113580356 | 申请日期 | 2011.01.06 |
| 申请人 | ASML Netherlands B.V. | 发明人 | Koole Roelof;Banine Vadim Yevgenyevich;Wuister Sander Frederik;Peeters Emiel |
| 分类号 | B05D3/02;G03F7/00;B82Y10/00;B82Y40/00 | 主分类号 | B05D3/02 |
| 代理机构 | Pillsbury Winthrop Shaw Pittman LLP | 代理人 | Pillsbury Winthrop Shaw Pittman LLP |
| 主权项 | 1. A method for treatment of a layer comprising self-assemblable polymer self-assembled at a surface of a substrate, the method comprising arranging for a zone of temperature change to sweep across the layer, wherein a temperature of the layer within the zone differs from an initial temperature of the layer prior to passage of the zone and a temperature within the zone exceeds an order-disorder transition temperature To/d of the self-assemblable polymer. | ||
| 地址 | Veldhoven NL | ||