发明名称 RAW MATERIAL FOR FORMING THIN FILM, PRODUCTION METHOD OF THIN FILM, AND NEW PHOSPHORUS COMPOUND
摘要 <p>PROBLEM TO BE SOLVED: To provide a raw material for forming a thin film that efficiently produces a thin film of high phosphorus concentration, and to provide a raw material for forming a thin film that is excellent in reactivity with a reactive gas and applicable to an ALD method, which is a method for obtaining a thin film having excellent step coverage.SOLUTION: A raw material for forming a thin film includes a phosphorus compound represented by general formula (1) below, (wherein Rindicates an alkyl group of 1-4 carbons; Rand Rindicate each independently hydrogen or an alkyl group of 1-4 carbons; and n indicates an integer of 1 or 2).</p>
申请公布号 JP2015074786(A) 申请公布日期 2015.04.20
申请号 JP20130209375 申请日期 2013.10.04
申请人 ADEKA CORP 发明人 SATO HIROKI;TONO TAKASHI;KAMIYAMA JUNJI
分类号 C23C16/18;C07F9/46;C07F9/48;C23C16/30;C23C16/455 主分类号 C23C16/18
代理机构 代理人
主权项
地址