发明名称 |
RAW MATERIAL FOR FORMING THIN FILM, PRODUCTION METHOD OF THIN FILM, AND NEW PHOSPHORUS COMPOUND |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a raw material for forming a thin film that efficiently produces a thin film of high phosphorus concentration, and to provide a raw material for forming a thin film that is excellent in reactivity with a reactive gas and applicable to an ALD method, which is a method for obtaining a thin film having excellent step coverage.SOLUTION: A raw material for forming a thin film includes a phosphorus compound represented by general formula (1) below, (wherein Rindicates an alkyl group of 1-4 carbons; Rand Rindicate each independently hydrogen or an alkyl group of 1-4 carbons; and n indicates an integer of 1 or 2).</p> |
申请公布号 |
JP2015074786(A) |
申请公布日期 |
2015.04.20 |
申请号 |
JP20130209375 |
申请日期 |
2013.10.04 |
申请人 |
ADEKA CORP |
发明人 |
SATO HIROKI;TONO TAKASHI;KAMIYAMA JUNJI |
分类号 |
C23C16/18;C07F9/46;C07F9/48;C23C16/30;C23C16/455 |
主分类号 |
C23C16/18 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|