发明名称 COPPER PARTICLE DISPERSION, CONDUCTIVE FILM FORMATION METHOD, AND CIRCUIT SUBSTRATE
摘要 An object is to provide a copper particulate dispersion which is suited to discharge in the form of droplets. The copper particulate dispersion includes copper particulates, at least one kind of a dispersion vehicle containing the copper particulates, and at least one kind of dispersant which allows the copper particulates to disperse in the dispersion vehicle. The copper particulates have a center particle diameter of 1 nm or more and less than 100 nm. The dispersion vehicle is a polar dispersion vehicle having a boiling point within a range from 150°C to 250°C. Whereby, when the copper particulate dispersion is discharged in the form of droplets, clogging at the discharge portion caused by drying of the dispersion vehicle is prevented and the viscosity is low for its high boiling point, and thus the copper particulate dispersion is suited to discharge in the form of droplets.
申请公布号 EP2738773(A4) 申请公布日期 2015.04.08
申请号 EP20120849820 申请日期 2012.01.04
申请人 ISHIHARA CHEMICAL CO., LTD.;APPLIED NANOTECH HOLDINGS, INC. 发明人 KAWATO, YUICHI;MAEDA, YUSUKE;KUDO, TOMIO
分类号 H01B1/02;C09D11/03;C09D11/52;H05K1/09 主分类号 H01B1/02
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