Substrate transfer method and storage medium

摘要

There is provided a substrate transfer method capable of preventing fine particles from adhering to a wafer. A substrate processing system 10 includes process modules 12 to 17 each having therein an inner space S1; a transfer module 11, having an inner space S2, connected to the process modules 12 to 17; and opening/closing gate valves 30 each partitioning the inner space S1 and the inner space S2. The transfer module 11 includes in the inner space S2 a transfer arm device 21 for holding a wafer W and for loading/unloading the wafer W into/from the process modules 12 to 17. The transfer arm device 21 holds the wafer W at a retreated position deviated from a facing position facing the gate valve 30 during an opening motion of the gate valve 30.

主权项

1. A substrate transfer method performed by a substrate transfer system including: a substrate processing apparatus having therein a first inner space; a substrate transfer apparatus, having a second inner space, connected to the substrate processing apparatus; an opening/closing partition valve for partitioning the first inner space and the second inner space; and a buffer for receiving the substrate within the second inner space, the substrate transfer apparatus including in the second inner space a substrate transfer device for holding at least one substrate and for loading/unloading the at least one substrate into/from the substrate processing apparatus, the method comprising:
before an opening motion of the opening/closing partition valve is started, transferring the substrate from the substrate transfer device to the buffer and lifting the substrate up to a retreated position which is higher than a port for communicating the first inner space to the second inner space; and after the opening motion of the opening/closing partition valve is finished, lowering the substrate to a height corresponding to said port and transferring the substrate from the buffer to the substrate transfer device, so that the substrate is positioned at a facing position facing the opening/closing partition valve.