发明名称 |
PERIODIC TABLE GROUP 13 METAL NITRIDE CRYSTALS AND METHOD FOR MANUFACTURING PERIODIC TABLE GROUP 13 METAL NITRIDE CRYSTALS |
摘要 |
A periodic table Group 13 metal nitride crystals grown with a non-polar or semi-polar principal surface have numerous stacking faults. The purpose of the present invention is to provide a period table Group 13 metal nitride crystal wherein the occurrence of stacking faults of this kind are suppressed. The present invention achieves the foregoing by a periodic table Group 13 metal nitride crystal being characterized in that, in a Qx direction intensity profile that includes a maximum intensity and is derived from an isointensity contour plot obtained by x-ray reciprocal lattice mapping of (100) plane of the periodic table Group 13 metal nitride crystal, a Qx width at 1/300th of peak intensity is 6×10−4 rlu or less. |
申请公布号 |
US2015093318(A1) |
申请公布日期 |
2015.04.02 |
申请号 |
US201414502249 |
申请日期 |
2014.09.30 |
申请人 |
MITSUBISHI CHEMICAL CORPORATION |
发明人 |
ENATSU Yuuki;NAGAO Satoru;KUBO Shuichi;IKEDA Hirotaka;FUJITO Kenji |
分类号 |
C30B29/40;H01L21/02;H01L29/20;C30B25/14;C30B25/20 |
主分类号 |
C30B29/40 |
代理机构 |
|
代理人 |
|
主权项 |
1. A periodic table Group 13 metal nitride substrate that is a single-crystal substrate obtained by processing a periodic table Group 13 metal nitride crystal grown by hydride vapor-phase epitaxy on a non-polar or semi-polar plane of a periodic table Group 13 metal nitride,
wherein, in a Qx direction intensity profile that includes a maximum intensity and is derived from an isointensity contour plot obtained by x-ray reciprocal lattice mapping of (100) plane of the periodic table Group 13 metal nitride crystal, a Qx width at 1/300th of peak intensity is 6×10−4 rlu or less. |
地址 |
Chiyoda-ku JP |