发明名称 MASK AND METHOD FOR MANUFACTURING SPACER
摘要 A mask (1) and a method for manufacturing a spacer (2) by utilizing the mask (1). The mask (1) comprises a transparent region and a non-transparent region. The transparent region comprises multiple optical through holes (230) arranged in an array. A phase shift layer (240) is formed in one of the regions of adjacent two optical through holes (230) of the mask (1) to generate a phase shift of a light that passes through. As such, the light intensity of the light passing through the adjacent two optical through holes (230) can be reduced or decreased to zero in a diffraction region, thus mitigating or even preventing the phenomenon of adhesion being formed between adjacent two spacers when manufacturing the spacer (2).
申请公布号 WO2015043214(A1) 申请公布日期 2015.04.02
申请号 WO2014CN78461 申请日期 2014.05.26
申请人 BOE TECHNOLOGY GROUP CO., LTD.;BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD. 发明人 CHEN, XIAOCHUAN;XUE, HAILIN;CHE, CHUNCHENG;JIANG, WENBO;LI, YUE
分类号 G03F1/26;G02F1/1339 主分类号 G03F1/26
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