| 摘要 |
<p>Disclosed is a method for filling holes of a graphene thin film, capable of minimizing defects in the graphene thin film. According to an embodiment of the present invention, the method for filling holes of a graphene thin film comprises: a first step of preparing a graphene thin film; a second step of filling pores existing in the graphene thin film with a nanocarbon material or an aromatic compound; and a third step of heating the graphene thin film of which the pores have been filled, thereby combining the pores and the nanocarbon material or aromatic compound. The nanocarbon material is at least one material selected from fullerene, a carbon nanotube, carbon black and nano diamond, and the aromatic compound is at least one compound selected from aromatic compounds having at least two benzene rings and derivatives thereof.</p> |
