Photoresist System and Method

摘要

A system and method for photoresists is provided. In an embodiment a cross-linking or coupling reagent is included within a photoresist composition. The cross-linking or coupling reagent will react with the polymer resin within the photoresist composition to cross-link or couple the polymers together, resulting in a polymer with a larger molecular weight. This larger molecular weight will cause the dissolution rate of the photoresist to decrease, leading to a better depth of focus for the line.

主权项

1. A photoresist comprising:
a polymer resin within the photoresist; a photoactive compound; and a cross-linking agent, wherein the cross-linking agent has a structure ofwherein n can be from between 1 to 15, A and B comprise H, OH, halide, an aromatic carbon ring, or a straight or cyclic alkyl, alkoxyl/fluoro, alkyl/fluoroalkoxyl chain having a carbon number of between 1 and 12, and X and Y comprise —NH2, —SH, —OH, isopropyl alcohol, isopropyl amine, or a thiol.