发明名称 ELECTRICAL INSPECTION OF ELECTRONIC DEVICES USING ELECTRON-BEAM INDUCED PLASMA PROBES
摘要 A non-mechanical contact signal measurement apparatus includes a first conductor on a structure under test and a gas in contact with the first conductor. At least one electron beam is directed into the gas so as to induce a plasma in the gas where the electron beam passes through the gas. A second conductor is in electrical contact with the plasma. A signal source is coupled to an electrical measurement device through the first conductor, the plasma, and the second conductor when the plasma is directed on the first conductor. The electrical measurement device is responsive to the signal source.
申请公布号 EP2732299(A4) 申请公布日期 2015.03.25
申请号 EP20120814801 申请日期 2012.07.10
申请人 ORBOTECH LTD.;PHOTON DYNAMICS INC. 发明人 KADYSHEVITCH, ALEXANDER;KADAR, OFER;GLAZER, ARIE;LOEWINGER, RONEN;GROSS, ABRAHAM;TOET, DANIEL
分类号 G01R31/28;G01R1/07;G01R31/02;G01R31/26;G01R31/305 主分类号 G01R31/28
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