发明名称 Copper pillar full metal via electrical circuit structure
摘要 An electrical interconnect including a first circuitry layer with a first surface and a second surface. At least a first dielectric layer is printed on the first surface of the first circuitry layer to include a plurality of first recesses. A conductive material is deposited in a plurality of the first recesses to form a plurality of first conductive pillars electrically coupled to, and extending generally perpendicular to, the first circuitry layer. At least a second dielectric layer is printed on the first dielectric layer to include a plurality of second recesses generally aligned with a plurality of the first conductive pillars. A conductive material is deposited in a plurality of the second recesses to form a plurality of second conductive pillars electrically coupled to, and extending parallel the first conductive pillars.
申请公布号 US8987886(B2) 申请公布日期 2015.03.24
申请号 US201213413724 申请日期 2012.03.07
申请人 HSIO Technologies, LLC 发明人 Rathburn James
分类号 H01L23/52;H01L23/498;H01L21/48;H01L21/768 主分类号 H01L23/52
代理机构 Stoel Rives LLP 代理人 Stoel Rives LLP
主权项 1. A method of making an electrical interconnect comprising the steps of: providing a first circuitry layer comprising a first surface and a second surface; applying at least a first dielectric layer on the first surface of the first circuitry layer to include a plurality of first recesses; plating a conductive material that substantially fills a plurality of the first recesses comprising a plurality of first conductive pillars electrically coupled to, and extending generally perpendicular to, the first circuitry layer; planarizing the first conductive pillars and the first dielectric layer before applying the second dielectric layer; applying at least a second dielectric layer on the first dielectric layer to include a plurality of second recesses generally aligned with a plurality of the first conductive pillars; plating a conductive material that substantially fills a plurality of the second recesses comprising a plurality of second conductive pillars electrically coupled to, and extending parallel to the first conductive pillars; and electrically coupling contact pads on an IC device to a plurality of the second conductive pillars.
地址 Maple Grove MN US