发明名称 |
Copper pillar full metal via electrical circuit structure |
摘要 |
An electrical interconnect including a first circuitry layer with a first surface and a second surface. At least a first dielectric layer is printed on the first surface of the first circuitry layer to include a plurality of first recesses. A conductive material is deposited in a plurality of the first recesses to form a plurality of first conductive pillars electrically coupled to, and extending generally perpendicular to, the first circuitry layer. At least a second dielectric layer is printed on the first dielectric layer to include a plurality of second recesses generally aligned with a plurality of the first conductive pillars. A conductive material is deposited in a plurality of the second recesses to form a plurality of second conductive pillars electrically coupled to, and extending parallel the first conductive pillars. |
申请公布号 |
US8987886(B2) |
申请公布日期 |
2015.03.24 |
申请号 |
US201213413724 |
申请日期 |
2012.03.07 |
申请人 |
HSIO Technologies, LLC |
发明人 |
Rathburn James |
分类号 |
H01L23/52;H01L23/498;H01L21/48;H01L21/768 |
主分类号 |
H01L23/52 |
代理机构 |
Stoel Rives LLP |
代理人 |
Stoel Rives LLP |
主权项 |
1. A method of making an electrical interconnect comprising the steps of:
providing a first circuitry layer comprising a first surface and a second surface; applying at least a first dielectric layer on the first surface of the first circuitry layer to include a plurality of first recesses; plating a conductive material that substantially fills a plurality of the first recesses comprising a plurality of first conductive pillars electrically coupled to, and extending generally perpendicular to, the first circuitry layer; planarizing the first conductive pillars and the first dielectric layer before applying the second dielectric layer; applying at least a second dielectric layer on the first dielectric layer to include a plurality of second recesses generally aligned with a plurality of the first conductive pillars; plating a conductive material that substantially fills a plurality of the second recesses comprising a plurality of second conductive pillars electrically coupled to, and extending parallel to the first conductive pillars; and electrically coupling contact pads on an IC device to a plurality of the second conductive pillars. |
地址 |
Maple Grove MN US |