DUAL-TARGET SPUTTER DEPOSITION WITH CONTROLLED PHASE DIFFERENCE BETWEEN TARGET POWERS

摘要

System and method of insulating film deposition. A sputter deposition chamber comprises a pair of targets made of the same insulating material. Each target is applied with a high frequency power signal concurrently. A phase adjusting unit is used to adjust the phase difference between the high frequency power signals supplied to the pair of targets to a predetermined value, thereby improving the in-plane thickness distribution of a resultant film. The predetermined value is target material specific.

主权项

1. A physical vapor deposition apparatus comprising:
a first sputter target coupled to a first high frequency (HF) power signal; a second sputter target coupled to a second HF power signal, wherein the first HF power signal and the second HF power signal are concurrently applied to said first sputter target and said second sputter target respectively; and a phase adjuster coupled to said first HF power signal and said second HF power signal and configured to adjust a phase difference between said first HF power signal and said second HF power signal.