发明名称 |
TWO-STEP METHOD FOR JOINING A SEMICONDUCTOR TO A SUBSTRATE WITH CONNECTING MATERIAL BASED ON SILVER |
摘要 |
<p>The invention relates to a method for joining a semiconductor (20) to a substrate (10), comprising the following steps:•applying a first paste layer (1) of a sintering paste to the substrate;•heating and compressing the first paste layer to form a first sintered layer;•applying a second paste layer (2) of a sintering paste to the first sintered layer and arranging a semiconductor (20) on the second paste layer;•heating and compressing the second paste layer (2) to form a second sintered layer. The invention further relates to a semiconductor component produced by means of the method.</p> |
申请公布号 |
EP2847787(A1) |
申请公布日期 |
2015.03.18 |
申请号 |
EP20130715652 |
申请日期 |
2013.04.02 |
申请人 |
ROBERT BOSCH GMBH |
发明人 |
FRUEH, CHRISTIANE;GUENTHER, MICHAEL;HERBOTH, THOMAS |
分类号 |
H01L21/60 |
主分类号 |
H01L21/60 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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