发明名称 TWO-STEP METHOD FOR JOINING A SEMICONDUCTOR TO A SUBSTRATE WITH CONNECTING MATERIAL BASED ON SILVER
摘要 <p>The invention relates to a method for joining a semiconductor (20) to a substrate (10), comprising the following steps:•applying a first paste layer (1) of a sintering paste to the substrate;•heating and compressing the first paste layer to form a first sintered layer;•applying a second paste layer (2) of a sintering paste to the first sintered layer and arranging a semiconductor (20) on the second paste layer;•heating and compressing the second paste layer (2) to form a second sintered layer. The invention further relates to a semiconductor component produced by means of the method.</p>
申请公布号 EP2847787(A1) 申请公布日期 2015.03.18
申请号 EP20130715652 申请日期 2013.04.02
申请人 ROBERT BOSCH GMBH 发明人 FRUEH, CHRISTIANE;GUENTHER, MICHAEL;HERBOTH, THOMAS
分类号 H01L21/60 主分类号 H01L21/60
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