发明名称 トレンチゲート型半導体装置
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a trench gate type semiconductor device which has a low on-voltage and reduces gate noise by providing insulating body having a high capacity to a FP layer and an emitter electrode. <P>SOLUTION: The trench gate type semiconductor device is characterized in that adjacent first and second regions are formed between adjacent insulating gates and a third semiconductor layer in the second region is electrically connected to a first main electrode via an insulating body with a high electric capacity. <P>COPYRIGHT: (C)2011,JPO&INPIT</p>
申请公布号 JP5686507(B2) 申请公布日期 2015.03.18
申请号 JP20090186977 申请日期 2009.08.12
申请人 发明人
分类号 H01L29/78;H01L29/739 主分类号 H01L29/78
代理机构 代理人
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