| 摘要 |
A liquid immersion type exposure apparatus according to the present invention includes a measuring region for measuring a substrate, an exposure region which is different from the measuring region and exposes the substrate through an optical projection system, stages which hold the substrate and move between the exposure region and the measuring region, and a controller which controls the operation of the stages. When one of the stages is located in the exposure region and a liquid immersion liquid supplied onto the one stage is transferred from the exposure region to another stage, the controller determines the delivery position of the liquid immersion liquid on the another stage based on the first process position of at least another stage. |
