PRODUCTION METHOD OF PATTERNED RETARDATION FILM, EXPOSURE APPARATUS, AND MASK

摘要

PROBLEM TO BE SOLVED: To provide a patterned retardation film to be applied to a three-dimensional image display by a passive system, which can be produced with high accuracy by sufficiently blocking oblique light compared to the prior arts.SOLUTION: A production method of a patterned retardation film includes: a photoalignment material film production step of producing a photoalignment material film on a substrate; an exposure step of producing a photoalignment film 3 by exposing the photoalignment material film using a mask 16; and a retardation layer production step of producing a retardation layer on the photoalignment film 3, the retardation layer including a first region that imparts a corresponding retardation to transmitted light; and a second region that imparts a retardation different from the retardation by the first region to the transmitted light. The mask 16 includes: a first light-shielding film 16A having a slit S corresponding to the first or second region; and a second light-shielding film 16B held at a given distance from the first light-shielding film 16A and parallel to the first light-shielding film 16A, with a slit S overlapping the slit of the first light-shielding film 16A.