METHOD FOR PRODUCING RETICLE, RETICLE PRODUCED BY THE PRODUCTION METHOD, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method for producing reticle suppressing the increase of CAD data.SOLUTION: There is provided a method for producing a reticle used in the production of a semiconductor device, comprising: a step of inputting a first circuit pattern data for light proximity effect compensation including periodic compensation components into a first memory region of a drawing apparatus; and a step of inputting a first dimensional increase/decrease distribution data for compensating a circuit pattern to be drawn on a reticle substrate into a second memory region of the drawing apparatus, using the first circuit pattern data for light proximity effect compensation by the drawing apparatus.