| 摘要 |
PROBLEM TO BE SOLVED: To provide a patterning method for simplifying the manufacturing process by forming grooves of different pattern, respectively, in two laminated layers collectively, and to provide a method of manufacturing a nonvolatile storage device using the same.SOLUTION: In a patterning method, a first layer and a second layer provided selectively on the first layer are etched selectively by using a mask covering them, thus forming grooves for dividing the first and second layers, respectively. The mask has a first part and a second part formed on the first layer. The first part has a first extension extending over the second layer toward the second part. The second part has a second extension extending over the second layer toward the first part. |
