发明名称 METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE, METHOD OF FORMING PATTERN AND METHOD OF FORMING FINE PATTERN
摘要 <p>PROBLEM TO BE SOLVED: To provide a method of producing a structure containing a phase-separated structure, a method of forming a pattern, and a method of forming a fine pattern.SOLUTION: A method of producing a structure containing a phase-separated structure includes the steps of: forming a layer including a neutralization film, on a substrate; forming a layer containing a block copolymer on the layer including the neutralization film, the block copolymer including a Pblock and a Pblock mutually bonded with each other, the Pblock including a structural unit other than a structural unit constituting the Pblock; and annealing the layer containing the block copolymer. When a surface free energy of the Pblock, a surface free energy of the Pblock and a surface free energy of the neutralization film are represented by a coordinate point A of the Pblock: ((dP), (pP)), a coordinate point B of the Pblock: ((dP), (pP)) and a point N of the neutralization film: ((dP), (pP)), respectively in the plane of coordinates of (a dispersive component (d), a polar component (p)), the point N of the neutralization film is within a predetermined range.</p>
申请公布号 JP2015046590(A) 申请公布日期 2015.03.12
申请号 JP20140153199 申请日期 2014.07.28
申请人 TOKYO OHKA KOGYO CO LTD 发明人 MATSUMIYA YU;SESHIMO TAKEHIRO;MIYAGI MASARU;MAEBASHI TAKAYA;DAZAI NAOHIRO;UTSUMI YOSHIYUKI
分类号 H01L21/3065;B82Y30/00;B82Y40/00;H01L21/027;H01L21/312 主分类号 H01L21/3065
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