摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method of producing a structure containing a phase-separated structure, a method of forming a pattern, and a method of forming a fine pattern.SOLUTION: A method of producing a structure containing a phase-separated structure includes the steps of: forming a layer including a neutralization film, on a substrate; forming a layer containing a block copolymer on the layer including the neutralization film, the block copolymer including a Pblock and a Pblock mutually bonded with each other, the Pblock including a structural unit other than a structural unit constituting the Pblock; and annealing the layer containing the block copolymer. When a surface free energy of the Pblock, a surface free energy of the Pblock and a surface free energy of the neutralization film are represented by a coordinate point A of the Pblock: ((dP), (pP)), a coordinate point B of the Pblock: ((dP), (pP)) and a point N of the neutralization film: ((dP), (pP)), respectively in the plane of coordinates of (a dispersive component (d), a polar component (p)), the point N of the neutralization film is within a predetermined range.</p> |